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Publications by Hitoshi Chawanya

Highly-Efficient Photoacid Generators for ArF Resist.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Related publications

Implementation of ArF Resist Processes for 130nm and Below.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Chemically Amplified Silicon Containing Resist for ArF Excimer Laser Lithography.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Deformation Analysis of ArF Resist Pattern by Using AFM

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Chemically Amplified Si-Contained Resist Using Silsesquoxane for ArF Lithography (CASUAL) and Its Application to Bi-Layer Resist Process.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Terahertz Generators: Terahertz Phonon Mode Engineering of Highly Efficient Organic Terahertz Generators (Adv. Funct. Mater. 14/2017)

Advanced Functional Materials

Materials Science

Condensed Matter Physics

Electrochemistry

Magnetic Materials

English

Non-Ionic Photoacid Generators Sensitive to 365nm Light-Synthesis and Applications to Photocrosslinking Systems-

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Design of Novel ArF Negative Resist System for Phase-Shifting Lithography Using Androsterone Structure With .DELTA.-Hydroxy Acid.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Photocrosslinking System Based on Poly(vinyl Phenol) and Fluorene Derivatives With Epoxy Unit Using Photoacid and Photobase Generators.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Pulse Radiolysis Study on a Highly Sensitive Chlorinated Resist ZEP520A

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English