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Publications by I. Pollentier

Implementation of ArF Resist Processes for 130nm and Below.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Related publications

Highly-Efficient Photoacid Generators for ArF Resist.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Chemically Amplified Silicon Containing Resist for ArF Excimer Laser Lithography.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Chemically Amplified Si-Contained Resist Using Silsesquoxane for ArF Lithography (CASUAL) and Its Application to Bi-Layer Resist Process.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Deformation Analysis of ArF Resist Pattern by Using AFM

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Immersion Lithography: Topcoat and Resist Processes

English

Design of Novel ArF Negative Resist System for Phase-Shifting Lithography Using Androsterone Structure With .DELTA.-Hydroxy Acid.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Modeling Ocean Processes Below Fimbulisen, Antarctica

Journal of Geophysical Research

Planetary Sciences

Atmospheric Science

Aquatic Science

Earth-Surface Processes

Planetary Science

English

Basic Aspects of Acid Generation Processes in Chemically Amplified Electron Beam Resist

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Czech Republic and Processes of Industry 4.0 Implementation

Annals of DAAAM and Proceedings of the International DAAAM Symposium

Systems Engineering

Mechanical Engineering

Electronic Engineering

Manufacturing Engineering

Computer Science Applications

English