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Publications by Isa L. Ferrall

Correction: Enhanced Photoelectrochemical Water Oxidation via Atomic Layer Deposition of TiO2on Fluorine-Doped Tin Oxide Nanoparticle Films

Materials Science

English

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Perovskite Thin Films via Atomic Layer Deposition

Advanced Materials

Mechanics of Materials

Materials Science

Mechanical Engineering

English

Atomic Layer Deposition of Al-Doped ZnO Thin Films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Condensed Matter Physics

English

Comparison of Thermal and Plasma-Enhanced Atomic Layer Deposition of Niobium Oxide Thin Films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Condensed Matter Physics

English

Optical and Electrical Properties of Antimony and Fluorine Doped Tin Oxide Thin Films

Universal Journal of Physics and Application

English

Incomplete Elimination of Precursor Ligands During Atomic Layer Deposition of Zinc-Oxide, Tin-Oxide, and Zinc-Tin-Oxide

Journal of Chemical Physics

Theoretical Chemistry

English

Transparent Conductive Aluminium and Fluorine Co-Doped Zinc Oxide Films via Aerosol Assisted Chemical Vapour Deposition

Chemical Engineering

English

Effects of Seed Layer and Thermal Treatment on Atomic Layer Deposition-Grown Tin Oxide

Transactions on Electrical and Electronic Materials

Electronic Engineering

Magnetic Materials

English

Photoelectrochemical Behavior of N-Type Si(100) Electrodes Coated With Thin Films of Manganese Oxide Grown by Atomic Layer Deposition

Journal of Physical Chemistry C

Theoretical Chemistry

Magnetic Materials

English

Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition

Journal of the Electrochemical Society

Condensed Matter Physics

Electrochemistry

Materials Chemistry

Magnetic Materials

Renewable Energy

the Environment

English