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Publications by J. Stefani

Run by Run Advanced Process Control of Metal Sputter Deposition

IEEE Transactions on Semiconductor Manufacturing
Electronic EngineeringIndustrialCondensed Matter PhysicsManufacturing EngineeringOpticalElectricalMagnetic MaterialsElectronic
1998English

Related publications

Integrating Feedback Control and Run-To-Run Control in Multi-Wafer Thermal Atomic Layer Deposition of Thin Films

Processes
TechnologyProcess ChemistryChemical EngineeringBioengineering
2019English

Gaussian Process Regression for Virtual Metrology-Enabled Run-To-Run Control in Semiconductor Manufacturing

IEEE Transactions on Semiconductor Manufacturing
Electronic EngineeringIndustrialCondensed Matter PhysicsManufacturing EngineeringOpticalElectricalMagnetic MaterialsElectronic
2018English

Run-To-Run Control of DC-sputtering Processes

2001English

Performance Evaluation of Run-To-Run Control Methods in Semiconductor Processes

English

Convergence Analysis of Run-To-Run Control for a Class of Nonlinear Systems

English

Short Run and Long Run

1994English

The Run-By-Run Monte Carlo Simulation for the ANTARES Experiment

EPJ Web of Conferences
AstronomyPhysics
2016English

Review Essay: Run Lola Run and Berlin Calling

Dancecult
2010English

Formation of Metal Nanoparticles by Short-Distance Sputter Deposition in a Reactive Ion Etching Chamber

Journal of Applied Physics
AstronomyPhysics
2009English

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