Amanote Research
Register
Sign In
Discover open access scientific publications
Search, annotate, share and cite publications
Publications by J.E. Bjorkholm
Development of Compact Extreme Ultraviolet Interferometry for On-Line Test of Lithography Cameras
Related publications
Extreme Ultraviolet Interferometry
Guest Editorial: Extreme Ultraviolet Interference Lithography
Journal of Micro/ Nanolithography, MEMS, and MOEMS
Electronic Engineering
Condensed Matter Physics
Mechanical Engineering
Electronic
Molecular Physics,
Nanoscience
Optical
Electrical
Atomic
Magnetic Materials
Nanotechnology
Optics
Pushing Extreme Ultraviolet Lithography Development Beyond 22 Nm Half Pitch
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Power Scaling of an Extreme Ultraviolet Light Source for Future Lithography
Applied Physics Letters
Astronomy
Physics
Experimental Investigation of Beryllium-Based Multilayer Coatings for Extreme Ultraviolet Lithography
Intense Plasma Discharge Source at 135 Nm for Extreme-Ultraviolet Lithography
Optics Letters
Optics
Atomic
Molecular Physics,
Computational Study of Pattern Formation for Chemically Amplified Resists in Extreme Ultraviolet Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Enhancing Extreme Ultraviolet Photons Emission in Laser Produced Plasmas for Advanced Lithography
Physics of Plasmas
Condensed Matter Physics
Spectroscopic Study of Debris Mitigation With Minimum-Mass Sn Laser Plasma for Extreme Ultraviolet Lithography
Applied Physics Letters
Astronomy
Physics