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Publications by Jaime W. DuMont

Competition Between Al2O3 Atomic Layer Etching and AlF3 Atomic Layer Deposition Using Sequential Exposures of Trimethylaluminum and Hydrogen Fluoride

Journal of Chemical Physics

Theoretical Chemistry

English

Related publications

Atomic Layer Etching of Gallium Nitride (0001)

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Condensed Matter Physics

English

Consistency and Reproducibility in Atomic Layer Deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Condensed Matter Physics

English

Atomic Layer Deposition of InN Using Trimethylindium and Ammonia Plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Condensed Matter Physics

English

Silicon Diffusion Control in Atomic-Layer-Deposited Al2O3/La2O3/Al2O3 Gate Stacks Using an Al2O3 Barrier Layer

Nanoscale Research Letters

Materials Science

Condensed Matter Physics

English

Resistless Fabrication of Embedded Nanochannels by FIB Patterning, Wet Etching and Atomic Layer Deposition

English

Al2O3 Underlayer Prepared by Atomic Layer Deposition for Efficient Perovskite Solar Cells

Environmental Chemistry

Chemical Engineering

Materials Science

English

Design of an Atomic Layer Deposition Reactor for Hydrogen Sulfide Compatibility

Review of Scientific Instruments

Instrumentation

English

In Situ Reaction Mechanism Studies of Plasma-Assisted Atomic Layer Deposition of Al2O3

Applied Physics Letters

English

Atomic Layer Deposition for Energy and Environmental Applications

Advanced Materials Interfaces

Mechanics of Materials

Mechanical Engineering

English