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Publications by Jason Coyle
Group 11 Precursors for Atomic Layer Deposition: Design and Synthesis of Advanced Precursors Enabled by Investigations in Thermolysis
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Iminopyrrolidine Ligand Design and Novel Group Four Precursors for Chemical Vapour and Atomic Layer Deposition
Design, Synthesis and Thermal Analysis of Group 11 and 13 ALD Precursors
Thin Film Precursors, Properties and Applications: Chemical Vapour Deposition and Atomic Layer Deposition of Group 4, 11 and 13 Elements and Their Oxides
Surface Chemistry and Development of Group 11 and 13 Thin Film Vapour Deposition Precursors
Nonfluorinated Volatile Copper(I) 1, 3-Diketiminates as Precursors for Cu Metal Deposition via Atomic Layer Deposition
Tetraalkylammonium Fluorosilicates as Precursors for Electrochemical Deposition of Silicon Coatings. Synthesis and Thermal Stability
Journal of Chemistry and Chemical Engineering
Atomic Layer Deposition: Uniform and Size‐Controlled Synthesis of Pt Nanoparticle Catalyst by Fluidized Bed Reactor Atomic Layer Deposition for PEMFCs (Adv. Mater. Interfaces 21/2019)
Advanced Materials Interfaces
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Design of an Atomic Layer Deposition Reactor for Hydrogen Sulfide Compatibility
Review of Scientific Instruments
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Instrumentation
Atomic Layer Deposition: Conformal Physical Vapor Deposition Assisted by Atomic Layer Deposition and Its Application for Stretchable Conductors (Adv. Mater. Interfaces 22/2018)
Advanced Materials Interfaces
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