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Publications by Jochen Rohrer

Ab Initiothermodynamics of Deposition Growth: Surface Terminations of TiC(111) and TiN(111) Grown by Chemical Vapor Deposition

Physical Review B

English

Related publications

Surface Morphology Improvement of Metalorganic Chemical Vapor Deposition Al Films by Layered Deposition of Al and Ultrathin TiN

Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes

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Large-Area Growth of Turbostratic Graphene on Ni(111) via Physical Vapor Deposition

Scientific Reports

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Perfect Alignment and Preferential Orientation of Nitrogen-Vacancy Centers During Chemical Vapor Deposition Diamond Growth on (111) Surfaces

Applied Physics Letters

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Wafer-Scale and Selective-Area Growth of High-Quality Hexagonal Boron Nitride on Ni(111) by Metal-Organic Chemical Vapor Deposition

Scientific Reports

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Unusual Thermopower of Inhomogeneous Graphene Grown by Chemical Vapor Deposition

Applied Physics Letters

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Electronic Properties of Monolayer Tungsten Disulfide Grown by Chemical Vapor Deposition

Applied Physics Letters

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Chemical Vapor Deposition of Tin Sulfide From Diorganotin(IV) Dixanthates

Journal of Materials Science

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Materials Science

Mechanical Engineering

English

Process for Growth of Group-Iv Alloys Containing Tin by Remote Plasma Enhanced Chemical Vapor Deposition

Frontiers in Materials

Materials Science

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Effects of Growth Temperature on InN∕GaN Nanodots Grown by Metal Organic Chemical Vapor Deposition

Journal of Applied Physics

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