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Publications by John H. Burnett
Optical Materials for Immersion Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Related publications
Responding to the Challenge: Materials Design for Immersion Lithography
Journal of Photopolymer Science and Technology
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Advancing Immersion Lithography
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The Need of Top Anti-Reflective Coating Materials for ArF Immersion Lithography
Journal of Photopolymer Science and Technology
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Quantitative Pattern Collapse Metrology for 193nm Immersion Lithography
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Immersion Lithography: Topcoat and Resist Processes
SPIE Newsroom
High Refractive Index Fluid for Next Generation ArF Immersion Lithography
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Successors of ArF Water-Immersion Lithography: EUV Lithography, Multi-E-Beam Maskless Lithography, or Nanoimprint?
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Directed Self Assembly Materials for Semiconductor Lithography
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New Prospect of Successors to ArF Water-Immersion Lithography
Journal of Micro/ Nanolithography, MEMS, and MOEMS
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