Amanote Research
Register
Sign In
Discover open access scientific publications
Search, annotate, share and cite publications
Publications by Jonathan England
Characterization of Arsenic Plasma Doping and Postimplant Processing of Silicon Using Medium Energy Ion Scattering
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Surfaces
Electronic Engineering
Condensed Matter Physics
Instrumentation
Electronic
Optical
Materials Chemistry
Electrical
Magnetic Materials
Films
Process Chemistry
Coatings
Technology
Use of TRIDYN and Medium Energy Ion Scattering to Calibrate an Industrial Arsenic Plasma Doping Process
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Surfaces
Electronic Engineering
Condensed Matter Physics
Instrumentation
Electronic
Optical
Materials Chemistry
Electrical
Magnetic Materials
Films
Process Chemistry
Coatings
Technology
Related publications
Combining Dynamic Modelling Codes With Medium Energy Ion Scattering Measurements to Characterise Plasma Doping
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
High Energy Physics
Instrumentation
Nuclear
P-Type A-Si:H Doping Using Plasma Immersion Ion Implantation for Silicon Heterojunction Solar Cell Application
Solar RRL
Composition Profiles of InAs–GaAs Quantum Dots Determined by Medium-Energy Ion Scattering
Applied Physics Letters
Astronomy
Physics
Characterization of Aperiodic and Periodic Thin Cu Films Formed on the Five-Fold Surface Ofi−Al70Pd21Mn9using Medium-Energy Ion Scattering Spectroscopy
Physical Review B
Atomic Scale Simulations of Arsenic Ion Implantation and Annealing in Silicon
Materials Research Society Symposium - Proceedings
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Forefront of Advanced Plasma-Ion Processing
Journal of the Vacuum Society of Japan
Surfaces
Instrumentation
Interfaces
Spectroscopy
Materials Science
Fabrication and Characterization of Polymeric Optical Waveguides Using Standard Silicon Processing Technology
Heavy Arsenic Doping of Silicon Grown by Atmospheric Pressure Selective Epitaxial Chemical Vapor Deposition
Science and Technology of Advanced Materials
Materials Science
