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Publications by Jong G Ok
Continuous Phase-Shift Lithography With a Roll-Type Mask and Application to Transparent Conductor Fabrication
Nanotechnology
Mechanics of Materials
Electronic Engineering
Mechanical Engineering
Materials Science
Nanoscience
Electrical
Bioengineering
Nanotechnology
Chemistry
Related publications
Phase-Shift Mask Issues for 193-Nm Lithography
Experimental and Computational Studies of Phase Shift Lithography With Binary Elastomeric Masks
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Infrared Frequency Selective Surfaces Fabricated Using Optical Lithography and Phase-Shift Masks
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Algorithm to Derive Optimal Mask and Movement Patterns in Moving Mask Deep X-Ray Lithography (M2DXL)
IEEJ Transactions on Sensors and Micromachines
Electronic Engineering
Electrical
Mechanical Engineering
Flexible Silver-Mesh Electrodes With Moth-Eye Nanostructures for Transmittance Enhancement by Double-Sided Roll-To-Roll Nanoimprint Lithography
RSC Advances
Chemistry
Chemical Engineering
New Illumination Technology for Mask Aligner Lithography
Optik & Photonik
High Performing AgNWs Transparent Conducting Electrodes With 2.5ω/Sq Based Upon Roll-To-Roll Compatible Post Processing Technique
Nanoscale
Materials Science
Nanotechnology
Nanoscience
Overcoming Mask Blank Defects in EUV Lithography
SPIE Newsroom
Fabrication of Tailored Bragg Gratings by the Phase Mask Dithering/Moving Technique
Photonic Sensors
Optics
Molecular Physics,
Optical
Atomic
Magnetic Materials
Electronic