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Publications by Jorn van Engelen
Low Loss InP Membrane Photonic Integrated Circuits Enabled by 193-Nm Deep UV Lithography
Related publications
Low-Loss SOI Photonic Wires and Ring Resonators Fabricated With Deep UV Lithography
IEEE Photonics Technology Letters
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Deep Etched DBR Gratings in InP for Photonic Integrated Circuits
Low-Loss Si Waveguides With Variable-Shaped-Beam EB Lithography for Large-Scaled Photonic Circuits
Phase-Shift Mask Issues for 193-Nm Lithography
High-Q Photonic Crystal Nanocavities on 300 Mm SOI Substrate Fabricated With 193 Nm Immersion Lithography
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Integration of Directed Self-Assembly With 193 Nm Lithography
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Recent Advancements in 193 Nm Step and Scan Lithography.
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Approaching the Numerical Aperture of Water Immersion Lithography at 193-Nm