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Publications by K. Shimokawa

Highly Stable Fluorinated Plasma CVD Silicon Nitride Film by SiH4 Addition for ULSI Passivation

1989English

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Improvement of Silicon Nitride Film Deposition Rate by Low Frequency Double Plasma CVD Methode.

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Hydrophilic Silicon Oxide Film by Pulsed Plasma CVD

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Improved Silicon Surface Passivation Achieved by Negatively Charged Silicon Nitride Films

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Hard Carbon Film Coating by Plasma CVD.

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Preparation of Crystallized Carbon Nitride Based on Microwave Plasma CVD-Effect of Carbon Source and H2 Addition to Gas System on Film Properties-

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Uniformity and Passivation Research of Al2O3 Film on Silicon Substrate Prepared by Plasma-Enhanced Atom Layer Deposition

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Self-Assembled Fluorinated Polymer Passivation Layer for Efficient Perovskite Thin-Film Solar Cells

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N, NH, and NH2 Radical Densities in a Remote Ar–NH3–SiH4 Plasma and Their Role in Silicon Nitride Deposition

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Fluorinated SiC CVD

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