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Publications by K.H. Thulasi Raman

RF Plasma MOCVD of Y2O3 Thin Films: Effect of RF Self-Bias on the Substrates During Deposition

Applied Surface Science

Condensed Matter Physics

English

Structural and Mechanical Properties of Fibre Textured Ti-C-N Coatings

Asian Journal of Applied Sciences

Multidisciplinary

English

Related publications

Nanoparticle Deposition in Hydrogenated Amorphous Silicon Films During Rf Plasma Deposition

Applied Physics Letters

English

A Deposition Model of Ultra Thin Plasma Polymerized Acethylene Films by Pulsed RF Discharge

IEEJ Transactions on Fundamentals and Materials

Electronic Engineering

English

Characteristics of Diamond-Like Carbon Thin Films Prepared by a RF Plasma Pulse Deposition Method

English

Preparation of YBaCuO Superconducting Thin Fiims by Rf and Microwave Plasma-Enhanced MOCVD

IEEJ Transactions on Fundamentals and Materials

Electronic Engineering

English

Application of Optical Emission Spectroscopy of the RF Sputtering Plasma to Deposition of ZnO Piezoelectric Thin Films.

English

A Brief Overview of RF Sputtering Deposition of Boron Carbon Nitride (BCN) Thin Films

Emergent Materials

English

Effect on Antenna Structure of High-Power Rf During Plasma Operation

AIP Conference Proceedings

English

Effect of Annealing on A-Si:H Thin Films Fabricated by RF Magnetron Sputtering

Korean Journal of Materials Research

Materials Science

English

Carbon Nitride Thin Films Prepared by a Capacitively Coupled RF Plasma Jet

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

High Energy Physics

Instrumentation

English