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Publications by Kazuo AKASHI
Low-Temperature (111) Oriented ZrO2 Film Deposition Using Mode-Converted Micromove Plasma MOCVD.
Journal of the Surface Finishing Society of Japan
Carbothermic Reduction of Niobium Pentoxide in High Temperature Zone of Direct Current Plasma Arc
Journal of the Mining and Metallurgical Institute of Japan
Preparation of Boron Nitride Thin Films by Using Plasma Chemical Transport of Boron.
Journal of the Surface Finishing Society of Japan
Coating of Hydroxyapatite on Zirconia Utilizing a Radio-Frequency Thermal Plasma Process
Journal of the Ceramic Society of Japan
Related publications
Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
Nanoscale Research Letters
Materials Science
Nanotechnology
Condensed Matter Physics
Nanoscience
Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
Preparation of TiO2-ZrO2 Films by MOCVD.
NIPPON KAGAKU KAISHI
Low-Temperature Deposition of Silicon Dioxide Films in High-Density Plasma
Semiconductor Physics, Quantum Electronics and Optoelectronics
Electronic Engineering
Optics
Molecular Physics,
Optical
Electrical
Atomic
Magnetic Materials
Electronic
Improvement of Silicon Nitride Film Deposition Rate by Low Frequency Double Plasma CVD Methode.
SHINKU
Characterization of SiNx Film by Room Temperature Low Frequency (50Hz) Plasma CVD.
SHINKU
DBD Plasma-ZrO2 Catalytic Decomposition of CO2 at Low Temperatures
Catalysts
Theoretical Chemistry
Catalysis
Physical
Atomic Layer Deposition of Crystalline MoS2Thin Films: New Molybdenum Precursor for Low-Temperature Film Growth
Advanced Materials Interfaces
Mechanics of Materials
Mechanical Engineering
InN Nano-Column Grown on Si (111) Substrate Using Au Catalyst by MOCVD
