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Publications by Keiichi Nii

Atomic Order Flattening of Hydrogen-Terminated Si(110) Substrate for Next Generation ULSI Devices

English

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Oxidation of Hydrogen-Terminated Si Surfaces.

English

Refractory Metal/Si Substrate Interfacial Reactions During ULSI Processing.

English

Carrier Transport Characteristics of H-Terminated Diamond Films Prepared Using Molecular Hydrogen and Atomic Hydrogen

International Journal of Minerals, Metallurgy and Materials

Mechanics of Materials

Mechanical Engineering

Materials Chemistry

English

Next Generation Hybrid Nanofiber Based Electrochromic Devices

Academic Perspective Procedia

English

Microstructural Observation of Next-Generation Strained Si-Sgoi Wafer

English

Towards Next Generation Time-Domain Diffuse Optics Devices

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Silicon-Germanium Composition Engineering for Next Generation Multilayer Devices and Systems

English

Self-Healing Materials for Next-Generation Energy Harvesting and Storage Devices

Advanced Energy Materials

Materials Science

the Environment

Renewable Energy

English

Atomically Resolved Scanning Tunneling Microscopy of Hydrogen-Terminated Si(001) Surfaces After HF Cleaning

Applied Physics Letters

English