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Publications by Keishi KAWABATA
Effect of Substrate Bipolar Pulse Voltage on the Properties of Cu Films on the Paper Substrate Using Magnetron Sputtering With Multipolar Magnetic Plasma Confinement Assisted by Inductively Coupled Plasma
Journal of the Vacuum Society of Japan
Surfaces
Instrumentation
Interfaces
Spectroscopy
Materials Science
On Extreme Point Results for Delta-Operator Diamond Polynomials
Transactions of the Institute of Systems, Control and Information Engineers
Related publications
Effect of Ion Irradiation for Ni Films Prepared on a Flexible Substrate Material Using Magnetron Sputtering With Multipolar Magnetic Plasma Confinement Assisted by Inductively Coupled Plasma
Journal of the Vacuum Society of Japan
Surfaces
Instrumentation
Interfaces
Spectroscopy
Materials Science
Synthesis of Metal Oxycarbides by Inductively Coupled Radiofrequency Plasma Assisted Magnetron Sputtering Method
SHINKU
Effect of Ion Irradiation for Ni Films Prepared on an Acrylonitrile-Butadiene-Styrene Resin Using Unbalanced Magnetron Sputtering Assisted by Inductively Coupled Plasma
Journal of the Vacuum Society of Japan
Surfaces
Instrumentation
Interfaces
Spectroscopy
Materials Science
Giant Magnetoresistance of NiFe/Cu Multilayers Prepared by Magnetron Sputtering Enhanced With an Inductively Coupled Rf Plasma
Journal of the Magnetics Society of Japan
ITO Thin Films Prepared by Magnetron Sputtering Method Using ITO Target. Effects of Plasma Conditions and Substrate Temperature on ITO Film Properties.
JSME International Journal Series B
Synthesis of Iron Oxide Films by Reactive Magnetron Sputtering Assisted by Plasma Emission Monitoring
Materials Chemistry and Physics
Materials Science
Condensed Matter Physics
Effect of Sputtering Power on the Properties of TaN Thin Films Prepared by the Magnetron Sputtering
DEStech Transactions on Materials Science and Engineering
Effects of Substrate Bias Voltages on Hardness of BCN Films Prepared by RF Magnetron Sputtering
Transactions of the Materials Research Society of Japan
Micro Variable Infrared Filter Using Magnetron Sputtering System Enhanced With an Inductively Coupled RF Plasma for CO2 Measurement.
SHINKU