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Publications by Ki-Ho Baik
A Novel Alicyclic Polymers for 193nm Single Layer Resist Materials.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Related publications
A Surface-Silylated Single-Layer Resist Using Chemical Amplification: A New Simpler Alternative for Multilayer Resist System.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Lithographic Characteristics of Alicyclic Polymer Based ArF Single Layer Resists.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Implant Resist Approaches for 193nm Second Generation Radiation Sensitive Developable Bottom Anti Reflective Coatings
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Thioether Bond Containing Polymers as Novel Cathode Active Materials for Rechargeable Lithium Batteries
Designing High Performance KrF and ArF Single Layer Resists With Methacrylate Polymers.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Advancements in EUV Resist Materials and Processing
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Chemically Amplified Si-Contained Resist Using Silsesquoxane for ArF Lithography (CASUAL) and Its Application to Bi-Layer Resist Process.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Materials to Resist Wear—A Guide to Their Selection and Use
Journal of Tribology
Mechanics of Materials
Surfaces
Mechanical Engineering
Interfaces
Films
Coatings
Step-Growth Polymers for High-Performance Materials
ACS Symposium Series
Chemistry
Chemical Engineering
