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Publications by Kohtaro Okada

Fabrication of A-CNx Films by RF-plasma Decomposition of BrCN

Transactions of the Materials Research Society of Japan

English

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Preparation of Hard CNx Films by Reactive Sputtering.

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Carbon Nitride Thin Films Prepared by a Capacitively Coupled RF Plasma Jet

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

High Energy Physics

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A Deposition Model of Ultra Thin Plasma Polymerized Acethylene Films by Pulsed RF Discharge

IEEJ Transactions on Fundamentals and Materials

Electronic Engineering

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Characteristics of Diamond-Like Carbon Thin Films Prepared by a RF Plasma Pulse Deposition Method

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RF Plasma MOCVD of Y2O3 Thin Films: Effect of RF Self-Bias on the Substrates During Deposition

Applied Surface Science

Condensed Matter Physics

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Fabrication of SiO2/Ge MIS Structures by Plasma Oxidation of Ultrathin Si Films Grown on Ge

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Nanoparticle Deposition in Hydrogenated Amorphous Silicon Films During Rf Plasma Deposition

Applied Physics Letters

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Cr-N Films Prepared by RF Magnetron Sputtering.

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Low-Temperature Fabrication of Layered Self-Organized Ge Clusters by RF-sputtering

Nanoscale Research Letters

Materials Science

Condensed Matter Physics

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