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Publications by Kuniaki Kobayashi
Effect of N2 Flow Rate on TiN Films Formed by DC Plasma CVD
Nippon Kinzoku Gakkaishi/Journal of the Japan Institute of Metals
Mechanics of Materials
Alloys
Materials Chemistry
Condensed Matter Physics
Metals
Related publications
Preparation of TiN Films by ECR Plasma CVD
Diamond Films Synthesized by DC Plasma CVD With a Diamond Cathode.
Journal of the Surface Finishing Society of Japan
Effect of Surface Roughness of WC-Co Substrate on TiN Film by CVD Process.
Zairyo/Journal of the Society of Materials Science, Japan
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Deposition of Nanocrystalline Diamond Films on Pure Ti by CH4/H2 Microwave Plasma CVD
Zairyo/Journal of the Society of Materials Science, Japan
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Field Electron-Emission From a-CN<sub>x</Sub>:H Films Formed on Al Films Using Supermagnetron Plasma CVD
Journal of Modern Physics
Effect of Oxygen Flow Rate on Fabrication of ZnO Thin Films Using Cold He Plasma at Atmospheric Pressure
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
Properties of the B-Si-N Ceramic Thin Films by Plasma-Cvd.
SHINKU
Effect of Additives on the Microstructure of Electroplated Tin Films
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
Erratum to : Comparison of Properties of TiN Films Deposited by Different Plasma Coating
Shinku
