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Publications by Laren M. Tolbert
High Sensitivity Nonchemically Amplified Molecular Resists Based on Photosensitive Dissolution Inhibitors
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Surfaces
Electronic Engineering
Condensed Matter Physics
Instrumentation
Electronic
Optical
Materials Chemistry
Electrical
Magnetic Materials
Films
Process Chemistry
Coatings
Technology
Patterning via Surface Monolayer Initiated Polymerization: A Study of Surface Initiator Photoreaction Kinetics
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Related publications
Study on Resist Performance of Chemically Amplified Molecular Resists Based on Cyclic Oligomers
Microelectronic Engineering
Surfaces
Electronic Engineering
Condensed Matter Physics
Electronic
Molecular Physics,
Nanoscience
Optical
Electrical
Atomic
Magnetic Materials
Films
Nanotechnology
Optics
Coatings
Fluorinated Chemically Amplified Dissolution Inhibitors for 157 Nm Nanolithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Organotin in Nonchemically Amplified Polymeric Hybrid Resist Imparts Better Resolution With Sensitivity for Next-Generation Lithography
Molecular Glass Resists for High-Resolution Patterning
Determination of Optimum Thermalization Distance Based on Trade-Off Relationship Between Resolution, Line Edge Roughness and Sensitivity of Chemically Amplified Extreme Ultraviolet Resists
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Dissolution Inhibition in Positive Novolak Resists
The Effects of Polymer Undercoats on the Pattern Profile of Chemically Amplified Resists.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Effect of Dissociation Constant of Catalytic Acids on the Characteristics of Chemically Amplified Resists.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Fabricating a High-Resolution Mask With Improved Line-Edge Roughness by Using a Nonchemically Amplified Resist and a Postexposure Bake
Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics
Surfaces
Electronic Engineering
Condensed Matter Physics
Instrumentation
Electronic
Optical
Materials Chemistry
Electrical
Magnetic Materials
Films
Process Chemistry
Coatings
Technology
