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Publications by Lukas Mai
Potential Precursor Alternatives to the Pyrophoric Trimethyl Aluminium for the Atomic Layer Deposition of Aluminium Oxide
Chemistry - A European Journal
Organic Chemistry
Catalysis
Chemistry
Related publications
Incomplete Elimination of Precursor Ligands During Atomic Layer Deposition of Zinc-Oxide, Tin-Oxide, and Zinc-Tin-Oxide
Journal of Chemical Physics
Medicine
Theoretical Chemistry
Astronomy
Physics
Physical
Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
Chemistry of Materials
Materials Chemistry
Chemistry
Chemical Engineering
Preparation of Graphene Oxide/Semiconductor Oxide Composites by Using Atomic Layer Deposition
Applied Surface Science
Surfaces
Astronomy
Condensed Matter Physics
Interfaces
Films
Coatings
Chemistry
Physics
Atomic Layer Deposition of Hafnium Oxide Using Anhydrous Hafnium Nitrate
Electrochemical and Solid-State Letters
Atomic Layer Deposition of Crystalline MoS2Thin Films: New Molybdenum Precursor for Low-Temperature Film Growth
Advanced Materials Interfaces
Mechanics of Materials
Mechanical Engineering
Effects of Seed Layer and Thermal Treatment on Atomic Layer Deposition-Grown Tin Oxide
Transactions on Electrical and Electronic Materials
Electronic Engineering
Optical
Electrical
Magnetic Materials
Electronic
Atomic Layer Deposition of an Sb2Se3 Photoabsorber Layer Using Selenium Dimethyldithiocarbamate as a New Se Precursor
The Effect of pH and Aluminium to Bacteria Isolated From Aluminium Recycling Industry
Journal of Ecological Engineering
Evolution
Ecology
Systematics
Behavior
Environmental Science
Tunability of Atomic Layer Deposition of Yttria-Stabilized Zirconium Oxide for Use in Solid Oxide Fuel Cells
The Journal of Undergraduate Research at the University of Illinois at Chicago
