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Publications by M. A. Klosner

Intense Plasma Discharge Source at 135 Nm for Extreme-Ultraviolet Lithography

Optics Letters
OpticsAtomicMolecular Physics,
1997English

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Pushing Extreme Ultraviolet Lithography Development Beyond 22 Nm Half Pitch

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Power Scaling of an Extreme Ultraviolet Light Source for Future Lithography

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Guest Editorial: Extreme Ultraviolet Interference Lithography

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Spectroscopic Study of Debris Mitigation With Minimum-Mass Sn Laser Plasma for Extreme Ultraviolet Lithography

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Characterization of a Liquid-Xenon-Jet Laser-Plasma Extreme-Ultraviolet Source

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Experimental Investigation of Beryllium-Based Multilayer Coatings for Extreme Ultraviolet Lithography

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Improved Emission Uniformity From a Liquid-Jet Laser-Plasma Extreme-Ultraviolet Source

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Enhancing Extreme Ultraviolet Photons Emission in Laser Produced Plasmas for Advanced Lithography

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Laser Produced Plasma for EUV Light Source for Lithography

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