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Publications by M. Fogazza

Formation of Anodic Films on Sputtering-Deposited Al–Hf Alloys

Electrochimica Acta

Chemical Engineering

Electrochemistry

English

Related publications

Effect of Sputtering Power on Microstucture and Electrochemical Characteristic of Nickel Films Deposited by Magnetron Sputtering

DEStech Transactions on Materials Science and Engineering

English

HfSiON Films Deposited by Radio Frequency Reactive Sputtering

English

AlNxOy Thin Films Deposited by DC Reactive Magnetron Sputtering

Applied Surface Science

Condensed Matter Physics

English

Deuterium Retention in Tungsten Films Deposited by Magnetron Sputtering

Physica Scripta

Condensed Matter Physics

Molecular Physics,

Mathematical Physics

English

Annealing Effects on V2o5-X Thin Films Deposited by Non Reactive Sputtering

Nanosystems: Physics, Chemistry, Mathematics

English

Characteristics of Er-Doped Al/Sub 2/O/Sub 3/ Thin Films Deposited by Reactive Co-Sputtering

IEEE Journal of Quantum Electronics

Electronic Engineering

Condensed Matter Physics

Molecular Physics,

English

Erratum To: Effects of in Situ Annealing on the Properties of Al-Doped ZnO Thin Films Deposited by RF Magnetron Sputtering

Journal of Materials Science: Materials in Electronics

Electronic Engineering

Biomedical Engineering

Condensed Matter Physics

Molecular Physics,

Magnetic Materials

English

Thermoluminescence Properties of Undoped Diamond Films Deposited Using HF CVD Technique

Materials Science-Poland

Mechanics of Materials

Materials Science

Condensed Matter Physics

Mechanical Engineering

English

Microstructure and Growth Modes of Stoichiometric NiAl and Ni 3 Al Thin Films Deposited by r.f.-magnetron Sputtering

Thin Solid Films

Materials Chemistry

Magnetic Materials

English