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Publications by M. L. Green
Evidence of Annealing Effects on a High-Density Si/SiO2 Interfacial Layer
Applied Physics Letters
Astronomy
Physics
Comment on “Analysis of Hydroxyl Group Controlled Atomic Layer Deposition of Hafnium Oxide From Hafnium Tetrachloride and Water” [J. Appl. Phys. 95, 4777 (2004)]
Journal of Applied Physics
Astronomy
Physics
Related publications
Effects of Hydrogen in the Annealing Environment on Photoluminescence From Si Nanoparticles in SiO2
Journal of Applied Physics
Astronomy
Physics
INTERFACIAL DEFECTS IN GaAs/Si AFTER ANNEALING
Le Journal de Physique Colloques
Phenomenological Theory on Si Layer-By-Layer Oxidation With Small Interfacial Islands
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
Engineering
Astronomy
Physics
X‐ray Scattering Studies of the SiO2/Si(001) Interfacial Structure
Applied Physics Letters
Astronomy
Physics
Millisecond Rapid Thermal Annealing of Si Wafer Induced by High Density Thermal Plasma Jet Irradiation
Mechanical Stability of Ultrathin Ge∕Si Film on SiO2: The Effect of Si∕SiO2 Interface
Journal of Applied Physics
Astronomy
Physics
Effects of Annealing With CO and CO2 Molecules on Oxygen Vacancy Defect Density in Amorphous SiO2 Formed by Thermal Oxidation of SiC
Journal of Applied Physics
Astronomy
Physics
Interfacial Effects on the Band Edges of Functionalized Si Surfaces in Liquid Water
Journal of the American Chemical Society
Biochemistry
Colloid
Catalysis
Chemistry
Surface Chemistry
Rapid Thermal Annealing of Size-Controlled Si Nanocrystals: Dependence of Interface Defect Density on Thermal Budget
Journal of Applied Physics
Astronomy
Physics