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Publications by Man-Young Park
Chemical Vapor Deposition of Copper Thin Films With (Hexafluoroacetylacetonate)Cu(allyltrimethylsilane)
Electrochemical and Solid-State Letters
Related publications
Hexafluoroacetylacetonate Cu Vinylcyclohexane as a Liquid Precursor for Low-Temperature Chemical Vapor Deposition of Copper Thin Films
Electrochemical and Solid-State Letters
Organometallic Chemical Vapor Deposition of Copper Oxide Thin Films
Excimer-Laser-Induced Chemical Vapor Deposition of Copper Films From Copper Trifluoroacetylacetonate
Le Journal de Physique IV
Microstructure and Deposition Rate of Aluminum Thin Films From Chemical Vapor Deposition With Dimethylethylamine Alane
Applied Physics Letters
Astronomy
Physics
Deposition and Properties of Zn3N2 Thin Films by Atmospheric Pressure Chemical Vapor Deposition
Transactions of the Materials Research Society of Japan
Proton Conductivity of Columnar Ceria Thin-Films Grown by Chemical Vapor Deposition
Physical Chemistry Chemical Physics
Theoretical Chemistry
Astronomy
Physics
Physical
Hydrogenated Silicon Carbide Thin Films Prepared With High Deposition Rate by Hot Wire Chemical Vapor Deposition Method
Journal of Coatings
Preparation of Thin Dielectric Films by Plasma-Assisted Chemical Vapor Deposition of Hexamethyldisilazane.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Chemical Vapor Deposition of Azidoalkylsilane Monolayer Films
