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Publications by Min-Ho Jung

A Novel Alicyclic Polymers for 193nm Single Layer Resist Materials.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Related publications

A Surface-Silylated Single-Layer Resist Using Chemical Amplification: A New Simpler Alternative for Multilayer Resist System.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Lithographic Characteristics of Alicyclic Polymer Based ArF Single Layer Resists.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Implant Resist Approaches for 193nm Second Generation Radiation Sensitive Developable Bottom Anti Reflective Coatings

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Thioether Bond Containing Polymers as Novel Cathode Active Materials for Rechargeable Lithium Batteries

English

Designing High Performance KrF and ArF Single Layer Resists With Methacrylate Polymers.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Advancements in EUV Resist Materials and Processing

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Chemically Amplified Si-Contained Resist Using Silsesquoxane for ArF Lithography (CASUAL) and Its Application to Bi-Layer Resist Process.

Journal of Photopolymer Science and Technology

Organic Chemistry

Materials Chemistry

English

Materials to Resist Wear—A Guide to Their Selection and Use

Journal of Tribology

Mechanics of Materials

Mechanical Engineering

English

Step-Growth Polymers for High-Performance Materials

ACS Symposium Series

Chemical Engineering

English