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Publications by Minoru HIRAI
Device Contamination by O2 Plasma Ashing.
Journal of the Surface Finishing Society of Japan
Related publications
A Chromium Discharge Minimizing Tanning Technology Assisted by O2 Low Temperature Plasma
DEStech Transactions on Engineering and Technology Research
A Study of Electrical Damage to A-Si:H Thin Film Transistor During Plasma Ashing by a Pin-To-Plate Type Atmospheric Pressure Plasma
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
Engineering
Astronomy
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Comparison of Sterilizing Effect of Nonequilibrium Atmospheric-Pressure He/O2 and Ar/O2 Plasma Jets
Plasma Science and Technology
Condensed Matter Physics
Spectroscopic Characterization of Plasma Generated by Microwave Device for Surface Treatment
Przeglad Elektrotechniczny
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Lifter - High Voltage Plasma Levitation Device
Revista Brasileira de Ensino de Física
Oxide Coated Cathode Plasma Source of Linear Magnetized Plasma Device
Plasma Science and Technology
Condensed Matter Physics
The Surface Modification by O2 Low Temperature Plasma to Improve Dyeing Properties of Rex Rabbit Fibers
Journal of Engineered Fibers and Fabrics
Materials Science
Maskless Surface Modification of Polyurethane Films by an Atmospheric Pressure He/O2 Plasma Microjet for Gelatin Immobilization
Micromachines
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Systems Engineering
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Erratum To: Porous Structure Formation on Silicon Surface Treated by Plasma Focus Device
Journal of Fusion Energy
High Energy Physics
Nuclear
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Nuclear Energy
