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Publications by Mitsliru UEDA

Photoresists for Microlithography Chemical Amplification in Resist Design

Journal of the Japan Society of Colour Material

English

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Special Issue/Recent Trend and Future of Photoresists for Microlithography. Recent Trend and Future of Optical Microlithography.

Journal of the Surface Finishing Society of Japan

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Special Issue/Recent Trend and Future of Photoresists for Microlithography. Recent Trend and Future of Multilayer Resists for Microlithography.

Journal of the Surface Finishing Society of Japan

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A Surface-Silylated Single-Layer Resist Using Chemical Amplification: A New Simpler Alternative for Multilayer Resist System.

Journal of Photopolymer Science and Technology

Organic Chemistry

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Special Issue/Recent Trend and Future of Photoresists for Microlithography. Recent Photoresist for Bump Plating.

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Lithography and Chemical Modeling of Acid Amplifiers for Use in EUV Photoresists

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Chemical Tools for Targeted Amplification of Reactive Oxygen Species in Neutrophils

Frontiers in Immunology

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Materials for Microlithography, Copyright, ACS Symposium Series, FOREWORD

ACS Symposium Series

Chemical Engineering

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Chemical Amplification Resists: Laboratory Curiosity to Paradigm

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A New Monocyclic Fluoropolymer for 157-Nm Photoresists

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