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Publications by Mundher Al-Shakban
Chemical Vapor Deposition of Tin Sulfide From Diorganotin(IV) Dixanthates
Journal of Materials Science
Mechanics of Materials
Materials Science
Mechanical Engineering
Related publications
Process for Growth of Group-Iv Alloys Containing Tin by Remote Plasma Enhanced Chemical Vapor Deposition
Frontiers in Materials
Materials Science
Atmospheric Pressure Chemical Vapor Deposition of TiN From Tetrakis(dimethylamido)titanium and Ammonia
Journal of Materials Research
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Atomically Controlled Processing for Group IV Semiconductors by Chemical Vapor Deposition
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
Engineering
Astronomy
Physics
Effects of Hydrogen Sulfide on the Plasma-Assisted Chemical Vapor Deposition of Carbon Nanotubes.
Hyomen Kagaku
Ab Initiothermodynamics of Deposition Growth: Surface Terminations of TiC(111) and TiN(111) Grown by Chemical Vapor Deposition
Physical Review B
Surface Morphology Improvement of Metalorganic Chemical Vapor Deposition Al Films by Layered Deposition of Al and Ultrathin TiN
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
Engineering
Astronomy
Physics
Physical Vapor Deposition of Methylammonium Tin Iodide Thin Films
Physica Status Solidi (A) Applications and Materials Science
Surfaces
Electronic Engineering
Condensed Matter Physics
Materials Chemistry
Optical
Electrical
Magnetic Materials
Films
Coatings
Electronic
Interfaces
Chemical Vapor Deposition of Tungsten Oxide
Applied Organometallic Chemistry
Inorganic Chemistry
Chemistry
Plasmon-Assisted Chemical Vapor Deposition
