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Publications by O. Nos
Hot Wire Configuration for Depositing Device Grade Nano-Crystalline Silicon at High Deposition Rate
Thin Solid Films
Surfaces
Alloys
Optical
Interfaces
Metals
Materials Chemistry
Magnetic Materials
Films
Coatings
Electronic
Related publications
High‐rate, Low‐temperature Deposition of Multifunctional Nano‐crystalline Silicon Nitride Films
Journal of Information Display
Electronic Engineering
Electrical
Materials Science
Hydrogenated Silicon Carbide Thin Films Prepared With High Deposition Rate by Hot Wire Chemical Vapor Deposition Method
Journal of Coatings
In Situ-Doped Silicon Thin Films for Passivating Contacts by Hot-Wire Chemical Vapor Deposition With a High Deposition Rate of 42 Nm/Min
Microdoping Compensation of Microcrystalline Silicon Obtained by Hot-Wire Chemical Vapour Deposition
Fuel and Energy Abstracts
Optimization of Deposition Parameters for Thin Silicon Films on Flexible Substrates in a Hot-Wire Chemical Vapor Deposition Reactor
Materials Science Forum
Doping of Amorphous and Microcrystalline Silicon Films Deposited at Low Substrate Temperatures by Hot-Wire Chemical Vapor Deposition
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Hot-Wire Polysilicon Waveguides With Low Deposition Temperature
Optics Letters
Optics
Atomic
Molecular Physics,
High-Rate Deposition of Amorphous Silicon Film by Atmospheric Pressure Plasma Chemical Vapor Deposition. (2nd Report). Investigation for Higher Deposition Rate.
Seimitsu Kogaku Kaishi/Journal of the Japan Society for Precision Engineering
Mechanical Engineering
The Use of Electron Channeling Patterns for Process Optimization of Low-Temperature Epitaxial Silicon Using Hot-Wire Chemical Vapor Deposition
Materials Research Society Symposium - Proceedings
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
