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Publications by P. Gergaud
Contacts for Monolithic 3D Architecture: Study of Ni0.9Co0.1 Silicide Formation
Thermal Expansion and Stress Development in the First Stages of Silicidation in Ti/Si Thin Films
Journal of Applied Physics
Astronomy
Physics
Related publications
TEM Characterisation of Silicide Phase Formation in Ni-Based Ohmic Contacts to 4H N-SiC
Materials Transactions
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Silicon-Nanowire Transistors With Intruded Nickel-Silicide Contacts
Silicon-Nanowire Transistors With Intruded Nickel-Silicide Contacts
Investigation of a Self-Aligned Cobalt Silicide Process for Ohmic Contacts to Silicon Carbide
Journal of Electronic Materials
Electronic Engineering
Condensed Matter Physics
Optical
Materials Chemistry
Electrical
Magnetic Materials
Electronic
TEM Study of Silicide Formation and Microstructural Development of Ni/ Si1-xGex
Microscopy and Microanalysis
Instrumentation
Mathematical Model for a Radioactive Marker in Silicide Formation
Journal of Applied Physics
Astronomy
Physics
Ultra Low-Resistance Palladium Silicide Ohmic Contacts to Lightly Doped N-InGaAs
Journal of Applied Physics
Astronomy
Physics
Formation of Ni Silicide Using Flash Lamp Technology
Formation of Palladium Silicide Thin Layers on Si(110) Substrates
Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes
Engineering
Astronomy
Physics
