Amanote Research
Register
Sign In
Discover open access scientific publications
Search, annotate, share and cite publications
Publications by P. J. Matsuo
Remote Plasma Etching of Silicon Nitride and Silicon Dioxide Using NF3/O2 Gas Mixtures
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Characterization of Al, Cu, and TiN Surface Cleaning Following a Low-K Dielectric Etch
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Related publications
Development of Low Temperature Silicon Nitride and Silicon Dioxide Films by Inductively-Coupled Plasma Chemical Vapor Deposition
Materials Research Society Symposium - Proceedings
Mechanics of Materials
Materials Science
Condensed Matter Physics
Mechanical Engineering
Surface Chemistry During Plasma Etching of Silicon
Pure and Applied Chemistry
Chemistry
Chemical Engineering
Anisotropic Reactive Ion Etching of Silicon Using SF[sub 6]/O[sub 2]/CHF[sub 3] Gas Mixtures
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
Forming Silicon Carbon Nitride Crystals and Silicon Carbon Nitride Nanotubes by Microwave Plasma-Enhanced Chemical Vapor Deposition
Applied Physics Letters
Astronomy
Physics
Chemical Etching of Silicon
Microscopy Today
Semi-Homogeneous Joining of Silicon Nitride Using Oxynitride Glass Insert Containing Silicon Nitride Powder and Post-Heat Treatment
Journal of the Ceramic Society of Japan
Materials Chemistry
Chemistry
Condensed Matter Physics
Composites
Ceramics
Etching Technologies of Silicon Wafer Using Dry Process
Journal of The Surface Finishing Society of Japan
Silicon Nitride Joining.
Criticality Characteristics of Mixtures of Plutonium, Silicon Dioxide, Nevada Tuff, and Water
