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Publications by P. Jaenen

Implementation of ArF Resist Processes for 130nm and Below.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2000English

Recent Advancements in 193 Nm Step and Scan Lithography.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
1999English

Related publications

Highly-Efficient Photoacid Generators for ArF Resist.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2000English

Chemically Amplified Silicon Containing Resist for ArF Excimer Laser Lithography.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
1997English

Chemically Amplified Si-Contained Resist Using Silsesquoxane for ArF Lithography (CASUAL) and Its Application to Bi-Layer Resist Process.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
1997English

Deformation Analysis of ArF Resist Pattern by Using AFM

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2007English

Immersion Lithography: Topcoat and Resist Processes

SPIE Newsroom
2007English

Design of Novel ArF Negative Resist System for Phase-Shifting Lithography Using Androsterone Structure With .DELTA.-Hydroxy Acid.

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2000English

Modeling Ocean Processes Below Fimbulisen, Antarctica

Journal of Geophysical Research
GeochemistrySpacePlanetary SciencesOceanographyPaleontologyPetrologySoil ScienceForestryAtmospheric ScienceEcologyGeophysicsAquatic ScienceEarthEarth-Surface ProcessesPlanetary ScienceTechnologyWater Science
2006English

Basic Aspects of Acid Generation Processes in Chemically Amplified Electron Beam Resist

Journal of Photopolymer Science and Technology
Organic ChemistryPolymersMaterials ChemistryPlastics
2005English

Czech Republic and Processes of Industry 4.0 Implementation

Annals of DAAAM and Proceedings of the International DAAAM Symposium
ControlSystems EngineeringIndustrialMechanical EngineeringElectronic EngineeringManufacturing EngineeringComputer Science ApplicationsElectrical
2018English

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