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Publications by P. Thony

Hyper High Numerical Aperature Achromatic Interferometer for Immersion Lithography at 193 Nm

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

English

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Phase-Shift Mask Issues for 193-Nm Lithography

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Integration of Directed Self-Assembly With 193 Nm Lithography

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Recent Advancements in 193 Nm Step and Scan Lithography.

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Photodissociation of Isobutene at 193 Nm

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High Refractive Index Fluid for Next Generation ArF Immersion Lithography

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