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Publications by P. W. Sandstrom

Magnetic-Field-Enhanced Rf Argon Plasma for Ionized Sputtering of Copper

Applied Physics Letters

English

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Electron Cyclotron Resonance Plasma Enhanced Direct Current Sputtering Discharge With Magnetic-Mirror Plasma Confinement

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Condensed Matter Physics

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Measurement of Some Argon Plasma Parameters Glow Discharge Under Axial Magnetic Field

Science Journal of University of Zakho

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Magnetic-Field Induced Strains in Ferromagnetic Shape Memory Alloy Ni55Mn23Ga22Deposited by RF-Magnetron Sputtering

Plasma Processes and Polymers

Condensed Matter Physics

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Micro Variable Infrared Filter Using Magnetron Sputtering System Enhanced With an Inductively Coupled RF Plasma for CO2 Measurement.

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Giant Magnetoresistance of NiFe/Cu Multilayers Prepared by Magnetron Sputtering Enhanced With an Inductively Coupled Rf Plasma

Journal of the Magnetics Society of Japan

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Turbulence Suppression by a Magnetic Field in Partially Ionized Plasma With Conductivity Gradient.

Kakuyūgō kenkyū

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Nano-Morphological, Magnetic and Structural Properties of Ni Films Prepared by RF-Sputtering

Engineering Journal

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Confinement of a Partially Ionized Gas by a Periodic Magnetic Field

Physics of Fluids

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RF Power Absorption by Plasma of Low Pressure Low Power Inductive Discharge Located in the External Magnetic Field

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