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Publications by Paul G. Hoertz

Correction: Enhanced Photoelectrochemical Water Oxidation via Atomic Layer Deposition of TiO2on Fluorine-Doped Tin Oxide Nanoparticle Films

Nanoscale
Materials ScienceNanotechnologyNanoscience
2015English

Atomic Layer Deposition for Electrochemical Energy Generation and Storage Systems

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SurfacesFilmsInterfacesCondensed Matter PhysicsCoatings
2012English

Related publications

Perovskite Thin Films via Atomic Layer Deposition

Advanced Materials
Mechanics of MaterialsMaterials ScienceNanotechnologyMechanical EngineeringNanoscience
2014English

Atomic Layer Deposition of Al-Doped ZnO Thin Films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SurfacesFilmsInterfacesCondensed Matter PhysicsCoatings
2013English

Comparison of Thermal and Plasma-Enhanced Atomic Layer Deposition of Niobium Oxide Thin Films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SurfacesFilmsInterfacesCondensed Matter PhysicsCoatings
2018English

Optical and Electrical Properties of Antimony and Fluorine Doped Tin Oxide Thin Films

Universal Journal of Physics and Application
2017English

Incomplete Elimination of Precursor Ligands During Atomic Layer Deposition of Zinc-Oxide, Tin-Oxide, and Zinc-Tin-Oxide

Journal of Chemical Physics
MedicineTheoretical ChemistryAstronomyPhysicsPhysical
2017English

Transparent Conductive Aluminium and Fluorine Co-Doped Zinc Oxide Films via Aerosol Assisted Chemical Vapour Deposition

RSC Advances
ChemistryChemical Engineering
2014English

Effects of Seed Layer and Thermal Treatment on Atomic Layer Deposition-Grown Tin Oxide

Transactions on Electrical and Electronic Materials
Electronic EngineeringOpticalElectricalMagnetic MaterialsElectronic
2010English

Photoelectrochemical Behavior of N-Type Si(100) Electrodes Coated With Thin Films of Manganese Oxide Grown by Atomic Layer Deposition

Journal of Physical Chemistry C
SurfacesEnergyNanoscienceTheoretical ChemistryOpticalMagnetic MaterialsFilmsNanotechnologyElectronicCoatingsPhysical
2013English

Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition

Journal of the Electrochemical Society
SurfacesCondensed Matter PhysicsOpticalElectrochemistrySustainabilityMaterials ChemistryMagnetic MaterialsRenewable EnergyFilmsCoatingsElectronicthe Environment
2006English

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