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Publications by Peter Pichler
Diffusion of Phosphorus and Boron From ALD Oxides Into Silicon
Physica Status Solidi (A) Applications and Materials Science
Surfaces
Electronic Engineering
Condensed Matter Physics
Materials Chemistry
Optical
Electrical
Magnetic Materials
Films
Coatings
Electronic
Interfaces
Related publications
Boron Diffusion in Silicon Oxides and Oxynitrides
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
A Semi-Empirical Hamiltonian for Boron, Phosphorus and Compounds Containing Boron, Phosphorus and Silicon.
Platinum Diffusion Into Silicon From PtSi
Applied Physics Letters
Astronomy
Physics
Black Silicon Significantly Enhances Phosphorus Diffusion Gettering
Scientific Reports
Multidisciplinary
Activation Volume for Phosphorus Diffusion in Silicon and Si0.93Ge0.07
Applied Physics Letters
Astronomy
Physics
Boron-Enhanced Diffusion of Boron From Ultralow-Energy Boron Implantation
Triple-Doped Monolayer Graphene With Boron, Nitrogen, Aluminum, Silicon, Phosphorus, and Sulfur
ChemPhysChem
Theoretical Chemistry
Physical
Optics
Atomic
Molecular Physics,
Modelling of Phosphorus and Boron Doping Concentration on SOI Wafer Based Diffusion Process
Logic: Jurnal Rancang Bangun dan Teknologi
Distributions of Boron and Phosphorus Implanted in Silicon in the Energy Range 0.1–1.5 MeV
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
High Energy Physics
Instrumentation
Nuclear
