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Publications by Ph. Roussel

Degradation and Breakdown of Sub-1nm EOT HfO2/Metal Gate Stacks

English

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Comprehensive Understanding of PBTI and NBTI Reliability of High-K / Metal Gate Stacks With EOT Scaling to Sub-1nm

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Spatial Distributions of Trapping Centers in HfO2∕SiO2 Gate Stacks

Applied Physics Letters

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Degradation of Polycrystalline HfO2-based Gate Dielectrics Under Nanoscale Electrical Stress

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Metal-Gate-Induced Reduction of the Interfacial Layer in Hf Oxide Gate Stacks

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Condensed Matter Physics

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Dielectric Properties of Er−doped HfO2 (Er∼15%) Grown by Atomic Layer Deposition for High-Κ Gate Stacks

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AlN/GaN Insulated Gate HEMTs With HfO2 Gate Dielectric

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Electronic Engineering

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Ultrathin HfO[sub 2](EOT<0.75 Nm) Gate Stack With TaN∕HfN Electrodes Fabricated Using a High-Temperature Process

Electrochemical and Solid-State Letters

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Anomalous Positive Flatband Voltage Shifts in Metal Gate Stacks Containing Rare-Earth Oxide Capping Layers

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Sub-1nm Patterning Accuracy via Spatial-Phase Locking

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