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Publications by Philippe Vereecken
Atomic Layer Deposition of Aluminum Phosphate Based on the Plasma Polymerization of Trimethyl Phosphate
Chemistry of Materials
Materials Chemistry
Chemistry
Chemical Engineering
Related publications
Atomic Layer Deposition of a Magnesium Phosphate Solid Electrolyte
Template-Based Synthesis of Aluminum Nitride Hollow Nanofibers via Plasma-Enhanced Atomic Layer Deposition
Journal of the American Ceramic Society
Composites
Materials Chemistry
Ceramics
Aluminum Nitride Transition Layer for Power Electronics Applications Grown by Plasma-Enhanced Atomic Layer Deposition
Materials
Materials Science
Condensed Matter Physics
Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
Calcium Phosphate Deposition With Normal Phosphate Concentration
Circulation Journal
Medicine
Cardiovascular Medicine
Cardiology
Potential Precursor Alternatives to the Pyrophoric Trimethyl Aluminium for the Atomic Layer Deposition of Aluminium Oxide
Chemistry - A European Journal
Organic Chemistry
Catalysis
Chemistry
Atomic Layer Deposition of InN Using Trimethylindium and Ammonia Plasma
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Comparison of Mechanical Properties and Composition of Magnetron Sputter and Plasma Enhanced Atomic Layer Deposition Aluminum Nitride Films
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Surfaces
Films
Interfaces
Condensed Matter Physics
Coatings
Study on Deposition of Al2O3 Films by Plasma-Assisted Atomic Layer With Different Plasma Sources
Plasma Science and Technology
Condensed Matter Physics
