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Publications by PingHung Lu
Implant Resist Approaches for 193nm Second Generation Radiation Sensitive Developable Bottom Anti Reflective Coatings
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Related publications
Bottom Anti-Reflective Coatings for DUV Lithography.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Advances and Challenges in Developable Bottom Anti-Reflective Coating (DBARC)
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
A Novel Alicyclic Polymers for 193nm Single Layer Resist Materials.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Dry-Developable Electron-Beam Resist. Synthesis and Resist Characteristic Evaluation of Amino-Ended Poly(.ALPHA.-Methylstyrene).
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Mass Screening for Second-Generation Anti-HCV Antibodies in AMHTS
Japanese journal of MHTS
High-Reflective Coatings for Ground and Space Based Applications
Modification of Gas-Thermal Coatings Surface by Continuous-Generation Laser Radiation
MATEC Web of Conferences
Materials Science
Engineering
Chemistry
Bottom Antireflective Coatings (BARCs) for 157-Nm Lithography
Developable Mechanisms on Developable Surfaces
Science Robotics
Control
Computer Science Applications
Optimization
Mechanical Engineering
Artificial Intelligence
