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Publications by Polla Rouf

Atomic Layer Deposition of InN Using Trimethylindium and Ammonia Plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SurfacesFilmsInterfacesCondensed Matter PhysicsCoatings
2019English

Related publications

Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide

Nanoscale Research Letters
Materials ScienceNanotechnologyCondensed Matter PhysicsNanoscience
2019English

Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SurfacesFilmsInterfacesCondensed Matter PhysicsCoatings
2011English

Low-Temperature Deposition of TiN by Plasma-Assisted Atomic Layer Deposition

Journal of the Electrochemical Society
SurfacesCondensed Matter PhysicsOpticalElectrochemistrySustainabilityMaterials ChemistryMagnetic MaterialsRenewable EnergyFilmsCoatingsElectronicthe Environment
2006English

Iridium Wire Grid Polarizer Fabricated Using Atomic Layer Deposition

Nanoscale Research Letters
Materials ScienceNanotechnologyCondensed Matter PhysicsNanoscience
2011English

Comparison of Thermal and Plasma-Enhanced Atomic Layer Deposition of Niobium Oxide Thin Films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
SurfacesFilmsInterfacesCondensed Matter PhysicsCoatings
2018English

Competition Between Al2O3 Atomic Layer Etching and AlF3 Atomic Layer Deposition Using Sequential Exposures of Trimethylaluminum and Hydrogen Fluoride

Journal of Chemical Physics
MedicineTheoretical ChemistryAstronomyPhysicsPhysical
2017English

Study on Property of Atomic Layer Epitaxy Growth of InN by Using Indium Chloride

Journal of Advanced Science
1992English

Study on Deposition of Al2O3 Films by Plasma-Assisted Atomic Layer With Different Plasma Sources

Plasma Science and Technology
Condensed Matter Physics
2018English

Atomic Layer Deposition of Hafnium Oxide Using Anhydrous Hafnium Nitrate

Electrochemical and Solid-State Letters
2002English

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