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Publications by R.H. Stulen
Development of Compact Extreme Ultraviolet Interferometry for On-Line Test of Lithography Cameras
Related publications
Extreme Ultraviolet Interferometry
Guest Editorial: Extreme Ultraviolet Interference Lithography
Journal of Micro/ Nanolithography, MEMS, and MOEMS
Electronic Engineering
Condensed Matter Physics
Mechanical Engineering
Electronic
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Nanoscience
Optical
Electrical
Atomic
Magnetic Materials
Nanotechnology
Optics
Pushing Extreme Ultraviolet Lithography Development Beyond 22 Nm Half Pitch
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Power Scaling of an Extreme Ultraviolet Light Source for Future Lithography
Applied Physics Letters
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Experimental Investigation of Beryllium-Based Multilayer Coatings for Extreme Ultraviolet Lithography
Intense Plasma Discharge Source at 135 Nm for Extreme-Ultraviolet Lithography
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Computational Study of Pattern Formation for Chemically Amplified Resists in Extreme Ultraviolet Lithography
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Enhancing Extreme Ultraviolet Photons Emission in Laser Produced Plasmas for Advanced Lithography
Physics of Plasmas
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Spectroscopic Study of Debris Mitigation With Minimum-Mass Sn Laser Plasma for Extreme Ultraviolet Lithography
Applied Physics Letters
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