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Publications by Rumiko Hayase
Positive Chemically Amplified Resists Using Naphthoquinone Diazides as Photo-Acid-Generators.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Related publications
Spatial Distribution of Reaction Products in Positive Tone Chemically Amplified Resists
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Novel Diffusion Analysis in Advanced Chemically Amplified DUV Resists Using Photometric Methods.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Photochemistry of Imino Sulfonate Compounds and Their Application to Chemically Amplified Resists.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Computational Study of Pattern Formation for Chemically Amplified Resists in Extreme Ultraviolet Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Study on Resist Performance of Chemically Amplified Molecular Resists Based on Cyclic Oligomers
Microelectronic Engineering
Surfaces
Electronic Engineering
Condensed Matter Physics
Electronic
Molecular Physics,
Nanoscience
Optical
Electrical
Atomic
Magnetic Materials
Films
Nanotechnology
Optics
Coatings
Chemically Amplified Resists. III. The Final Phenolic Product Formation Mechanism From T-Boc.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Activation Energies for Deprotection Reaction of Chemically Amplified Resists: A Study Using In-Situ FT-IR Spectroscopy.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
The Effects of Polymer Undercoats on the Pattern Profile of Chemically Amplified Resists.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Effect of Dissociation Constant of Catalytic Acids on the Characteristics of Chemically Amplified Resists.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
