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Publications by Ruomeng Huang

Compositionally Tunable Ternary Bi2(Se1−xTex)3 and (Bi1−ySby)2Te3 Thin Films via Low Pressure Chemical Vapour Deposition

Journal of Materials Chemistry C
Materials ChemistryChemistry
2018English

Electrodeposition of Crystalline HgTe From a Non-Aqueous Plating Bath

Journal of the Electrochemical Society
SurfacesCondensed Matter PhysicsOpticalElectrochemistrySustainabilityMaterials ChemistryMagnetic MaterialsRenewable EnergyFilmsCoatingsElectronicthe Environment
2018English

Related publications

Role of Defects in the Carrier-Tunable Topological-Insulator ( Bi1−xSbx ) 2Te3 Thin Films

Physical Review B
OpticalElectronicCondensed Matter PhysicsMagnetic Materials
2018English

Low-Pressure Chemical Vapour Deposition of Silicon Nanoparticles:Synthesis and Characterisation

Defence Science Journal
Electronic EngineeringMechanical EngineeringPhysicsComputer Science ApplicationsElectricalChemical EngineeringAstronomyBiomedical Engineering
2008English

Metal-Organic Chemical Vapour Deposition of Lithium Manganese Oxide Thin Films via Single Solid Source Precursor

Materials Science-Poland
Mechanics of MaterialsMaterials ScienceCondensed Matter PhysicsMechanical Engineering
2015English

The Gas-Sensing Properties of WO3−x Thin Films Deposited via the Atmospheric Pressure Chemical Vapour Deposition (APCVD) of WCl6 With Ethanol

Measurement Science and Technology
InstrumentationEngineeringApplied Mathematics
2008English

Aerosol Assisted Chemical Vapour Deposition of Hydroxyapatite-Embedded Titanium Dioxide Composite Thin Films

Journal of Photochemistry and Photobiology A: Chemistry
ChemistryPhysicsChemical EngineeringAstronomy
2017English

Deposition and Properties of Zn3N2 Thin Films by Atmospheric Pressure Chemical Vapor Deposition

Transactions of the Materials Research Society of Japan
2008English

The Aerosol Assisted Chemical Vapour Deposition of SnSe and Cu2SnSe3 Thin Films From Molecular Precursors

Chemical Communications
SurfacesAlloysMaterials ChemistryCoatingsMetalsOpticalMagnetic MaterialsFilmsCatalysisChemistryElectronicCompositesCeramics
2014English

Silicon Carbon Nitride Thin Films Deposited by Pulsed Microwave Plasma Assisted Chemical Vapour Deposition

Journal of Applied Sciences
2017English

Low-Pressure Chemical Vapor Deposition of LiCoO[sub 2] Thin Films: A Systematic Investigation of the Deposition Parameters

Journal of the Electrochemical Society
SurfacesCondensed Matter PhysicsOpticalElectrochemistrySustainabilityMaterials ChemistryMagnetic MaterialsRenewable EnergyFilmsCoatingsElectronicthe Environment
2009English

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