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Publications by S. Higashi
High Speed Lateral Crystallization of Amorphous Silicon Films on Glass Substrates by Micro-Thermal-Plasma-Jet Irradiation and Its Application to Thin Film Transistor Fabrication
Millisecond Rapid Thermal Annealing of Si Wafer Induced by High Density Thermal Plasma Jet Irradiation
Related publications
150°C Amorphous Silicon Thin-Film Transistor Technology for Polyimide Substrates
Journal of the Electrochemical Society
Surfaces
Condensed Matter Physics
Optical
Electrochemistry
Sustainability
Materials Chemistry
Magnetic Materials
Renewable Energy
Films
Coatings
Electronic
the Environment
Thermal Investigation of Joule-Heating-Induced Crystallization of Amorphous Silicon Thin Film
Transactions of the Korean Society of Mechanical Engineers, B
Mechanical Engineering
Direct Observation of Grain Growth From Molten Silicon Formed by Micro-Thermal-Plasma-Jet Irradiation
Applied Physics Letters
Astronomy
Physics
Integration of Amorphous and Polycrystalline Silicon Thin-Film Transistors Through Selective Crystallization of Amorphous Silicon
Applied Physics Letters
Astronomy
Physics
Application of Thin Film Diffractometer to Structural Study of Amorphous Thin Films.
Analytical Sciences
Analytical Chemistry
Size Effects on the Thermal Conductivity of Amorphous Silicon Thin Films
Physical Review B
Optical
Electronic
Condensed Matter Physics
Magnetic Materials
Thermal Conductivity and Specific Heat of Thin-Film Amorphous Silicon
Physical Review Letters
Astronomy
Physics
Micro Raman Spectroscopy Analysis of Doped Amorphous and Microcrystalline Silicon Thin Film Layers and Its Application in Heterojunction Silicon Wafer Solar Cells
Transactions of the Materials Research Society of Japan
Properties of Amorphous Silicon Thin Films and Their Film Growth Processes.
Hyomen Kagaku
