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Publications by Sander Reniers
Low Loss InP Membrane Photonic Integrated Circuits Enabled by 193-Nm Deep UV Lithography
Related publications
Low-Loss SOI Photonic Wires and Ring Resonators Fabricated With Deep UV Lithography
IEEE Photonics Technology Letters
Electronic Engineering
Optics
Molecular Physics,
Optical
Electrical
Atomic
Magnetic Materials
Electronic
Deep Etched DBR Gratings in InP for Photonic Integrated Circuits
Low-Loss Si Waveguides With Variable-Shaped-Beam EB Lithography for Large-Scaled Photonic Circuits
Phase-Shift Mask Issues for 193-Nm Lithography
High-Q Photonic Crystal Nanocavities on 300 Mm SOI Substrate Fabricated With 193 Nm Immersion Lithography
Journal of Lightwave Technology
Optics
Atomic
Molecular Physics,
Photonic Integrated Circuits
Photonics Russia
Integration of Directed Self-Assembly With 193 Nm Lithography
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Recent Advancements in 193 Nm Step and Scan Lithography.
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Approaching the Numerical Aperture of Water Immersion Lithography at 193-Nm
