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Publications by Senajith Rekawa
Overview and Status of the 0.5NA EUV Microfield Exposure Tool at Berkeley Lab
Related publications
EUV Lithography and Exposure Tool.
Journal of Plasma and Fusion Research
Progress Overview of EUV Resists Status Towards High-Na EUV Lithography
BEAMS Lab at MIT: Status Report
Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
High Energy Physics
Instrumentation
Nuclear
Observations of Local ISM Emission With the Berkeley EUV/FUV Shuttle Telescope
International Astronomical Union Colloquium
Tips to Assemble the Berkeley Lab Cosmic Ray Detector
Current Status of EUV Photoresists
Journal of Photopolymer Science and Technology
Organic Chemistry
Polymers
Materials Chemistry
Plastics
Overview of the CLEF eHealth Evaluation Lab 2019
Lecture Notes in Computer Science
Computer Science
Theoretical Computer Science
Overview of the PAN/CLEF 2015 Evaluation Lab
Lecture Notes in Computer Science
Computer Science
Theoretical Computer Science
OVERVIEW AND STATUS OF THE 12 GeV CRYOGENIC SYSTEM UPGRADE AT JLAB
