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Publications by Sergej Filonovich
Optimization of Deposition Parameters for Thin Silicon Films on Flexible Substrates in a Hot-Wire Chemical Vapor Deposition Reactor
Materials Science Forum
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Hydrogenated Silicon Carbide Thin Films Prepared With High Deposition Rate by Hot Wire Chemical Vapor Deposition Method
Journal of Coatings
In Situ-Doped Silicon Thin Films for Passivating Contacts by Hot-Wire Chemical Vapor Deposition With a High Deposition Rate of 42 Nm/Min
Deposition of Microcrystalline Silicon Prepared by Hot-Wire Chemical-Vapor Deposition: The Influence of the Deposition Parameters on the Material Properties and Solar Cell Performance
Journal of Applied Physics
Astronomy
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Doping of Amorphous and Microcrystalline Silicon Films Deposited at Low Substrate Temperatures by Hot-Wire Chemical Vapor Deposition
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
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The Use of Electron Channeling Patterns for Process Optimization of Low-Temperature Epitaxial Silicon Using Hot-Wire Chemical Vapor Deposition
Materials Research Society Symposium - Proceedings
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Low-Pressure Chemical Vapor Deposition of LiCoO[sub 2] Thin Films: A Systematic Investigation of the Deposition Parameters
Journal of the Electrochemical Society
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Renewable Energy
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the Environment
Organometallic Chemical Vapor Deposition of Copper Oxide Thin Films
Hot Wire Chemical Vapor Deposition of Isolated Carbon Single-Walled Nanotubes
Applied Physics Letters
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Deposition and Properties of Zn3N2 Thin Films by Atmospheric Pressure Chemical Vapor Deposition
Transactions of the Materials Research Society of Japan
