Amanote Research
Register
Sign In
Discover open access scientific publications
Search, annotate, share and cite publications
Publications by Shanshan Mao Shanshan Mao
Design of a Hyper-Numerical-Aperture Deep Ultraviolet Lithography Objective With Freeform Surfaces
Chinese Optics Letters
Electronic Engineering
Optics
Molecular Physics,
Optical
Electrical
Atomic
Magnetic Materials
Electronic
Related publications
Ptychography as a Wavefront Sensor for High-Numerical Aperture Extreme Ultraviolet Lithography: Analysis and Limitations
Optical Engineering
Engineering
Optics
Atomic
Molecular Physics,
Approaching the Numerical Aperture of Water Immersion Lithography at 193-Nm
A General Multi-Objective Hyper-Heuristic for Water Distribution Network Design With Discolouration Risk
Journal of Hydroinformatics
Geotechnical Engineering
Civil
Engineering Geology
Atmospheric Science
Structural Engineering
Water Science
Technology
Hyper High Numerical Aperature Achromatic Interferometer for Immersion Lithography at 193 Nm
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
Design of Optical Elements With TIR Freeform Surface
Computer Optics
Electronic Engineering
Pattern Recognition
Engineering
Molecular Physics,
Computer Vision
Computer Science Applications
Electrical
Atomic
Optics
On Dynamic Analysis of Contact Problems With Freeform Surfaces: A Knee Joint 3d-Study
Journal of Biomechanics
Sports Medicine
Sports Science
Biophysics
Orthopedics
Biomedical Engineering
Rehabilitation
Guest Editorial: Extreme Ultraviolet Interference Lithography
Journal of Micro/ Nanolithography, MEMS, and MOEMS
Electronic Engineering
Condensed Matter Physics
Mechanical Engineering
Electronic
Molecular Physics,
Nanoscience
Optical
Electrical
Atomic
Magnetic Materials
Nanotechnology
Optics
Fiducial-Aided Robust Positioning of Optical Freeform Surfaces
Micromachines
Control
Systems Engineering
Electrical
Mechanical Engineering
Electronic Engineering
Evaluation of Optical Characteristics in Deep Ultraviolet Region. Measurement of Optical Elements Used for Excimer Laser Lithography.
Journal of the Spectroscopical Society of Japan